GN 1.2.2701-10

Maximum permissible levels (MPL) of skin pollution by O-(1,2,2 trimethylpropyl) of methilfluorophosphonate (soman) and O-isopropylmethylfluorinephosphonate (sarin) for personnel working at chemical weapons storage and destruction facilities

Emergency exposure limits (EEL) of O-isobutyl-beta-n-diethylaminoethylthiol ester of methyl-phosphonic acid in the air of working area of facilities for storage and disposal of chemical weapons

Maximum allowable levels (MAL) of arsenic contamination of surfaces of process equipment and building structures of production facilities

Maximum permissible level (MPL) of pollution for process equipment by 2-chlorovinyldichloroarsine (lewisite) at chemical weapon storage and destruction facilities

Maximum allowable concentration (MAC) of methyl-phosphonic acid in wastes of building structures including wastes after thermal processing

Maximum allowable concentration (MAC) of O-isobutyl-beta-n-diethylaminoethylthiol ester of methyl-phosphonic acid (substances type Vx) in the air of working area (including aerosol of construction materials disintegration) at decommissioning of the facilities for storage and disposal of chemical weapons